Open access
Oct 2026
TiSi2 Phase Formation in Magnetron-Sputtered Ti Films on Silicon During Rapid Thermal Annealing
Titanium thin films were deposited on crystalline silicon substrates by DC magnetron sputtering and annealed by rapid thermal processing under vacuum and nitrogen environments. X-ray diffraction, atomic force microscopy, and four-point probe measurements were used to evaluate phase formation and electrical properties....
S. Keiinbay, K. Nussupov, N. Beisenkhanov et al.
· Nanomaterials · 0 citations