FOR THERMAL

Effect of deposition temperature on properties of undoped ultrasonically sprayed ZnO thin films

Characterization of silicon carbide thin films deposited by PECVD and PLD for MEMS infrared applications

Influence of substrate heating for microstructure and physical properties of Cu-Al-O thin film

We prepared Cu-Al-O thin films on silicon and quartz substrate by direct current (DC) reactive magnetron sputtering method. The substrate temperatures varied at room temperature (~25℃) and 200℃ with post-annealed at 900℃ in argon atmosphere for 3h. The results indicate that the film prepared at 200℃ is beneficial for t...

Impact of Rapid Thermal Annealing on the Structural and Piezoelectric Properties of AlN Thin Films

Aluminum nitride (AlN) is a biocompatible piezoelectric material with energy harvesting properties. This study examines the effects of post‐deposition rapid thermal annealing (RTA) on AlN thin films used in microelectromechanical systems (MEMS) resonators. RTA is performed in a N 2 ‐purged chamber at temperatures...

Preparation and Investigation of the Structural, Morphological, and Optical Properties of ZnO Thin Films by Chemical Spray Pyrolysis

Zinc oxide (ZnO) thin films prepared previously on borosilicate glass substrates by means of a method called chemical-thermal spray. Zinc chloride () aqueous solution was used at 0.1 M, and the film was deposited at a base temperature of 350°C with a total amount of 13 spray cycles (15 seconds each separated by a pause...

Performancee of 29 coatings on two typess of copper alloy substrates