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Author

Yuji Machiya

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Sep 2026

Lithographic performance and SEM-based geometrical analysis of curvilinear photomasks

Curvilinear photomasks are attracting significant attention as a potential enabler for improved lithographic performance in advanced semiconductor manufacturing. While their benefits have been widely discussed, a systematic understanding of their fundamental imaging behavior remains incomplete. In this study, we invest...

T. Adachi, Tatsuya Tomita, Yuji Machiya et al. · 0 citations

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