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Author

Kouichi Tsuji

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Temperature Dependence of Elemental Depth Profiles at the Au/Si Interface Using Confocal Micro X‐Ray Fluorescence Analysis

ABSTRACT This study aims to establish a method for nondestructively evaluating the elemental diffusion behavior at metal/semiconductor interfaces in situ, which is extremely important for reliability assessment of next‐generation semiconductor devices. Confocal micro X‐ray fluorescence spectrometry (CMXRF) was employed...

Riko Miyoshi, Kouichi Tsuji · 0 citations

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