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Jiaxin Shen

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Aug 2026

Influence of substrate heating for microstructure and physical properties of Cu-Al-O thin film

We prepared Cu-Al-O thin films on silicon and quartz substrate by direct current (DC) reactive magnetron sputtering method. The substrate temperatures varied at room temperature (~25℃) and 200℃ with post-annealed at 900℃ in argon atmosphere for 3h. The results indicate that the film prepared at 200℃ is beneficial for t...

Yong-Jian Zhang, Junting Fang, Jiaxin Shen et al. · 0 citations

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