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Jia-Zhi Miao

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Open access Oct 2026

Mechanistic Insights Into Oxidation-Regulated Material Removal of Soft-Brittle CdS in Chemical Mechanical Polishing

Cadmium sulfide (CdS) is a typical soft and brittle semiconductor widely used in infrared detection and optoelectronic devices. However, its low hardness and high brittleness make ultra-precision machining with low damage highly challenging. Chemical mechanical polishing (CMP) effectively yields atomically smooth sur...

Yang Chen, Ru Wang, Zhe Liang et al. · 0 citations

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