Bandgap engineering of tantalum nitride thin films by ion‑assisted magnetron sputtering for advanced electronic and radiation detection applications
Tantalum nitride (TaNx) thin films exhibit a wide range of electrical and optical properties that can be controlled by adjusting deposition conditions, making them attractive for microelectronics, protective coatings, and functional layers in radiation detectors and other advanced devices. In this work, TaNx films were...