Author

Hyeonguk Yeo

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Sep 2026

Corner-focused evaluation of AI-based design-to-real prediction for FPD photomasks

We developed an AI-based photomask simulator that predicts lithographic deformation from design GDS data for Flat Panel Display (FPD) photomasks. The simulator converts design layouts into image form and reproduces their optical appearance consistent with 100× measured real images. A deep-learning U-Net with SPADE resi...

Kun-Seok Lee, Hyeonguk Yeo, J. Heo et al. · Photomask Japan · 0 citations